Strumenti di analisi di maschere per migliorare la gestione delle prestazioni, consente di rilevare rapidamente le imperfezioni e i difetti inaccettabili.
JWS-3000 can link coordinate data, move the stage to the defect position easily, and then inspect & observe it on high resolution SEM by using online networking to various kinds of optical defect inspection systems. Using ADR (Auto Defect Review) and ADC (Auto Defect classification), The JWS can collect defect data automatically and classify to find the source quickly. An important feature is ease of operation without special training.
By employing a super-conical objective lens, the wafer can be tilted up to 45° without changing working distance. High resolution is maintained even in tilting observation.
It is not necessary to adjust each axis with changing observation conditions. The JWS can be equipped with various optional functions such as; CD measurement, optical microscope, EDS, INDEXER etc.
Example of pattern defect observation by JWS-3000
The JWS-3000 can obtain useful information for improving yield in manufacture process. The source of the defect and particles can be observed at high magnifications as well as multiple changing of tilt and rotation angles.